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公开(公告)号:US11658016B2
公开(公告)日:2023-05-23
申请号:US16409757
申请日:2019-05-10
Applicant: Applied Materials, Inc.
Inventor: Kathleen Scheible , Michael Allen Flanigan , Goichi Yoshidome , Adolph Miller Allen , Cristopher Pavloff
IPC: H01J37/34 , C23C14/34 , C23C14/50 , H01L21/687
CPC classification number: H01J37/3488 , C23C14/3407 , C23C14/50 , H01J37/34 , H01J37/3441 , H01J37/3447 , H01L21/68735
Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.
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公开(公告)号:US20190267220A1
公开(公告)日:2019-08-29
申请号:US16409757
申请日:2019-05-10
Applicant: Applied Materials, Inc.
Inventor: Kathleen Scheible , Michael Allen Flanigan , Goichi Yoshidome , Adolph Miller Allen , Cristopher Pavloff
IPC: H01J37/34 , H01L21/687 , C23C14/34 , C23C14/50
Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.
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