公开(公告)号：US20160059377A1

公开(公告)日：2016-03-03

申请号：US14470852

申请日：2014-08-27

Applicant: Applied Materials, Inc.

Inventor： Jeonghoon OH ,  Steven M. ZUNIGA ,  Andrew NAGENGAST ,  Samuel Chu-Chiang HSU ,  Gautam Shashank DANDAVATE

IPC: B24B37/10 ,  B24B37/30

CPC classification number: B24B37/107 ,  B24B37/11 ,  B24B37/30

Abstract: A polishing head for chemical mechanical planarization is provided. The polishing head includes a housing and a flexible membrane secured to the housing. At least a first, second, and third pressurizable chamber are disposed in the housing and each chamber contacts the flexible membrane. A first pressure delivery channel couples to the first chamber. A second pressure delivery channel couples to the third chamber. A first pressure feed line couples the first pressure delivery channel to the second chamber. A second pressure feed line couples the second pressure delivery channel to the second chamber. A first manually movable plug interfaces with the first pressure feed line to allow or block pressure from the first pressure delivery channel to the second chamber. A second manually movable plug interfaces with the second pressure feed line to allow or block pressure from the first pressure delivery channel to the second chamber.

Abstract translation: 提供了用于化学机械平面化的抛光头。 抛光头包括壳体和固定到壳体的柔性膜。 至少第一，第二和第三可加压室设置在壳体中，并且每个室接触柔性膜。 第一压力输送通道耦合到第一室。 第二压力输送通道联接到第三室。 第一压力供给管线将第一压力输送通道连接到第二室。 第二压力供给管线将第二压力输送通道连接到第二室。 第一可手动插头与第一压力进料管线接合以允许或阻止来自第一压力输送通道到第二室的压力。 第二可手动插头与第二压力进料管线接口，以允许或阻止来自第一压力输送通道到第二室的压力。