公开(公告)号：US20230124246A1

公开(公告)日：2023-04-20

申请号：US17505323

申请日：2021-10-19

Applicant: Applied Materials, Inc.

Inventor： Arun Chakravarthy Chakravarthy ,  Vinay K. Prabhakar ,  Dharma Ratnam Srichurnam ,  Hossein Rezvantalab

IPC: H01J37/32

Abstract: Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may include a top surface and side surfaces. The gas splitter may define a first and second gas inlets, with each gas inlet extending through one side surface. The gas splitter may define first and second gas outlets extending through the top surface. The gas splitter may define first and second gas lumens that extend between and fluidly couple each gas inlet with corresponding gas outlets. The gas splitter may define mixing channels that include a mixing outlet extending through a side surface and a mixing inlet extending through the top surface. The systems may include output manifolds seated on the lid plate. The systems may include output weldments that fluidly couple each mixing outlet with a respective one of the output manifolds.