公开(公告)号：US20250095967A1

公开(公告)日：2025-03-20

申请号：US18370155

申请日：2023-09-19

Applicant: Applied Materials, Inc.

Inventor： Morgan D. Evans ,  Peter F. Kurunczi

IPC: H01J37/32

Abstract: A plasma source having two extraction apertures is disclosed. The extraction apertures are not co-planar, allowing a scanned workpiece to be impacted by particles or ions from two different directions during a single scan pass. The chamber housing of the plasma source may be cylindrical or may have a polygonal cross-section. In some embodiments, external plates are mounted to the chamber housing to provide defining apertures which serve to further collimate the particles or ions that exit each extraction aperture. Various different plasma generators may be utilized with this plasma source, including internal antenna elements, external coils, cathodes, filaments and other mechanisms.