公开(公告)号：US20250028294A1

公开(公告)日：2025-01-23

申请号：US18223506

申请日：2023-07-18

Applicant: Applied Materials, Inc.

Inventor： Piyush Kumar Pandey ,  Prabal Sen ,  Ganapathy Saravanavel ,  Himadri Shekhar Hansda ,  Mohammed Dilkash Azam ,  Sidharth Bhatia

IPC: G05B19/18 ,  G05B23/02

Abstract: A method includes obtaining first data indicative of a measured profile of a substrate. The method further includes obtaining second data indicative of a profile of a reference substrate. The method further includes determining a corrected substrate profile based on the first data and the second data. The method further includes performing a corrective action based on the corrected substrate profile.