公开(公告)号：US20220291702A1

公开(公告)日：2022-09-15

申请号：US17198619

申请日：2021-03-11

Applicant: Applied Materials, Inc.

Inventor： Philip DiGiacomo ,  Sunil Kumar Garg ,  Paul G. Kiely ,  Keith A. Miller ,  Rajat Agrawal

IPC: G05D11/13 ,  G05B15/02 ,  G01N21/67

Abstract: A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.

公开(公告)号：US11868147B2

公开(公告)日：2024-01-09

申请号：US17198619

申请日：2021-03-11

Applicant: Applied Materials, Inc.

Inventor： Philip DiGiacomo ,  Sunil Kumar Garg ,  Paul G. Kiely ,  Keith A. Miller ,  Rajat Agrawal

IPC: G05D11/13 ,  G05B15/02 ,  G01N21/67

CPC classification number: G05D11/138 ,  G01N21/67 ,  G05B15/02

Abstract: A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.