公开(公告)号：US11378531B1

公开(公告)日：2022-07-05

申请号：US17164803

申请日：2021-02-01

Applicant: Applied Materials Israel Ltd.

Inventor： Arie Bader ,  Tamir Nuna

IPC: H01J37/28 ,  G01N23/2251

Abstract: A method, a non-transitory computer readable medium and a system for focusing an electron beam. The method may include focusing the electron beam on at least one evaluated area of a wafer, based on a height parameter of each one of the at least one evaluated area. The wafer includes a transparent substrate. The height parameter of each one of the at least one evaluated area is determined based on detection signals generated as a result of an illumination of one or more height-measured areas of the wafer with a beam of photons. The illumination occurs while one or more supported areas of the wafer contact one or more supporting elements of a chuck, and while each one of the one or more height-measured areas are spaced apart from the chuck by a distance that exceeds a depth of field of the optics related to the beam of photons.

公开(公告)号：US11264198B2

公开(公告)日：2022-03-01

申请号：US16160906

申请日：2018-10-15

Applicant: Applied Materials Israel Ltd.

Inventor： Igor Petrov ,  Zvika Rosenberg ,  Arie Bader

IPC: G02B21/02 ,  H01J37/145 ,  H01J37/28

Abstract: An objective lens arrangement that may include a magnetic lens and an electrostatic lens. The magnetic lens may include one or more coils, an upper polepiece and a lower polepiece. The electrostatic lens may include an upper electrode, an internal lower electrode and an external lower electrode. A majority of the internal lower electrode may be surrounded by a majority of the external lower electrode. The upper electrode, the internal lower electrode, and the external lower electrode are arranged in a coaxial relationship along an optical axis of the objective lens arrangement. An area of a bottom aperture of the external lower electrode may not exceed an area of a bottom aperture of the internal lower electrode.