公开(公告)号：US10295476B1

公开(公告)日：2019-05-21

申请号：US16103535

申请日：2018-08-14

Applicant: Applied Materials Israel Ltd.

Inventor： Binyamin Kirshner ,  Yehiel Kapoano

IPC: G01N21/88 ,  G01N21/95 ,  G02B26/08 ,  G02B27/10

Abstract: A system and method for multiple mode inspection of a sample. The system includes a radiation source, an objective lens, a bright field detection module, a dark field detection module and optics. The optics, when the system operates at a first mode, is configured to direct the input beam through a first opening, without substantially blocking any part of the input beam, towards a first region of the objective lens. The optics, when the system operates at a second mode, is configured to direct the input beam through a second opening, without substantially blocking any part of the input beam, towards a second region of the objective lens. The first region of the objective lens differs from the second region of the objective lens.