公开(公告)号：US11781213B2

公开(公告)日：2023-10-10

申请号：US17711260

申请日：2022-04-01

Applicant: Arcelor Mittal

Inventor： Sergio Pace ,  Eric Silberberg ,  Dimitri Wilders ,  Rémy Bonnemann ,  Lucie Gaouyat

IPC: C23C14/24 ,  C23C14/02 ,  C23C14/14 ,  C23C14/56

CPC classification number: C23C14/246 ,  C23C14/021 ,  C23C14/14 ,  C23C14/562

Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.