公开(公告)号：US20240018004A1

公开(公告)日：2024-01-18

申请号：US18036972

申请日：2020-11-18

Applicant: ArcelorMittal

Inventor： Laura MEGIDO FERNANDEZ ,  Cristina BOTAS VELASCO ,  Thi Tan VU ,  Roberto SUAREZ SANCHEZ

IPC: C01B32/198 ,  C01B32/194

CPC classification number: C01B32/198 ,  C01B32/194

Abstract: A method for the manufacture of a self-standing graphene oxide or reduced graphene oxide film having a thickness between 0.4 and 4.0 μm, including the successive steps of A) preparing an aqueous dispersion including 0.1 to 30 g·L−1 of graphene oxide or reduced graphene oxide, B) depositing the aqueous dispersion on a flat substrate coated with a polymeric film dissolvable in organic solvents and unsolvable in water, so as to form a wet film having a thickness comprised between 1 μm and 3.5 mm, C) drying the wet film, D) separating the polymeric film from the flat substrate, E) placing the polymeric film in a support frame, F) showering the polymeric film with an organic solvent to dissolve the polymeric film, G) separating the graphene oxide or reduced graphene oxide film from the frame to obtain the self-standing graphene oxide or reduced graphene oxide film.