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公开(公告)号:US20100013521A1
公开(公告)日:2010-01-21
申请号:US12527589
申请日:2008-03-28
申请人: Atsuo Mizuma , Masashi Aiba
发明人: Atsuo Mizuma , Masashi Aiba
IPC分类号: H03B21/00
CPC分类号: H03F1/0288 , H01P5/12 , H03F2200/451
摘要: A synthesizer is constructed by constituting a first λ/4 line of a first strip line and by constituting a second λ/4 line of a second strip line, so that it is formed into a chip shape (or a chip part) in a dielectric substrate. A first shield electrode is formed on the upper face of the dielectric substrate, and a second shield electrode is formed on the lower face of the dielectric substrate, so that the first λ/4 line and the second λ/4 line are formed between the first shield electrode and the second shield electrode.
摘要翻译: 通过构成第一带状线的第一λ/ 4线并通过构成第二带状线的第二λ/ 4线来构成合成器,从而在电介质中形成芯片形状(或芯片部分) 基质。 第一屏蔽电极形成在电介质基板的上表面上,并且第二屏蔽电极形成在电介质基板的下表面上,从而在第一屏蔽电极之间形成第一λ/ 4线和第二λ/ 第一屏蔽电极和第二屏蔽电极。