-
1.
公开(公告)号:US20120081206A1
公开(公告)日:2012-04-05
申请号:US13326706
申请日:2011-12-15
申请人: Atsushi Kishimoto , Wataru Aoto , Akinori Nakayama
发明人: Atsushi Kishimoto , Wataru Aoto , Akinori Nakayama
CPC分类号: H01C7/025 , C04B35/4682 , C04B2235/3208 , C04B2235/3258 , C04B2235/77 , C04B2235/79 , H01C17/06533
摘要: A semiconductor ceramic and a positive-coefficient characteristic thermistor are provided which have a stable PTC characteristic, a high double point, and a wide operating temperature range. The semiconductor ceramic contains, as a main component, a barium titanate-based composition having a perovskite structure expressed by a general formula AmBO3. Out of 100 mol % of the Ti, an amount in a range of 0.05 mol % or more to 0.3 mol % or less of Ti is replaced with W as a semiconductor forming agent, the ratio m of A sites mainly to B sites is 0.99≦m≦1.002, and an actually-measured sintered density is 70% or more and 90% or less of the theoretical sintered density. In the positive-coefficient characteristic thermistor, a component body is formed of the semiconductor ceramic.
摘要翻译: 提供了具有稳定的PTC特性,高双点和宽工作温度范围的半导体陶瓷和正系数特性热敏电阻。 半导体陶瓷作为主要成分含有具有由通式AmBO 3表示的钙钛矿结构的钛酸钡类组合物。 在100摩尔%的Ti中,作为半导体形成剂的W被替换为0.05摩尔%以上至0.3摩尔%以下的Ti的量,作为主要部位的A部位的比例m为0.99 ≦̸ m≦̸ 1.002,实际测量的烧结密度为理论烧结密度的70%以上且90%以下。 在正系数特性热敏电阻中,由半导体陶瓷形成元件体。
-
2.
公开(公告)号:US08390421B2
公开(公告)日:2013-03-05
申请号:US13326706
申请日:2011-12-15
申请人: Atsushi Kishimoto , Wataru Aoto , Akinori Nakayama
发明人: Atsushi Kishimoto , Wataru Aoto , Akinori Nakayama
IPC分类号: H01C7/10
CPC分类号: H01C7/025 , C04B35/4682 , C04B2235/3208 , C04B2235/3258 , C04B2235/77 , C04B2235/79 , H01C17/06533
摘要: A semiconductor ceramic and a positive-coefficient characteristic thermistor are provided which have a stable PTC characteristic, a high double point, and a wide operating temperature range. The semiconductor ceramic contains, as a main component, a barium titanate-based composition having a perovskite structure expressed by a general formula AmBO3. Out of 100 mol % of the Ti, an amount in a range of 0.05 mol % or more to 0.3 mol % or less of Ti is replaced with W as a semiconductor forming agent, the ratio m of A sites mainly to B sites is 0.99≦m≦1.002, and an actually-measured sintered density is 70% or more and 90% or less of the theoretical sintered density. In the positive-coefficient characteristic thermistor, a component body is formed of the semiconductor ceramic.
摘要翻译: 提供了具有稳定的PTC特性,高双点和宽工作温度范围的半导体陶瓷和正系数特性热敏电阻。 半导体陶瓷作为主要成分含有具有由通式AmBO 3表示的钙钛矿结构的钛酸钡类组合物。 在100摩尔%的Ti中,作为半导体形成剂的W被替换为0.05摩尔%以上至0.3摩尔%以下的Ti的量,作为主要部位的A部位的比例m为0.99 ≦̸ m≦̸ 1.002,实际测量的烧结密度为理论烧结密度的70%以上且90%以下。 在正系数特性热敏电阻中,由半导体陶瓷形成元件体。
-