公开(公告)号：US11543704B1

公开(公告)日：2023-01-03

申请号：US17086823

申请日：2020-11-02

Applicant: Beam Engineering For Advanced Measurement Co.

Inventor： Nelson V. Tabirian ,  Mark J. Moran ,  Olena Uskova ,  Justin Sigley

IPC: G02F1/1337 ,  G02F1/1334 ,  G02F1/01 ,  G02F1/137 ,  G02F1/1333

Abstract: Methods, materials, systems, and devices for stabilizing photoalignment patterns in liquid crystal diffractive waveplates (LCDWs) against radiation, mechanical, and electrical influences by creating a polymer network within the bulk of LCDW such as the polymer network does not affect the LC orientation pattern in the bulk of the DW and does not result in residual retardation and light scattering while being able to fast switching and relaxation with no haze at application of electric fields.