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公开(公告)号：US11740531B2
公开(公告)日：2023-08-29
申请号：US16956974
申请日：2019-07-31
发明人： Zhe Wang , Qingqing Ma , Chao Tian , Rui Xu , Min Wang , Tianjiao Wang , Yan Zhang , Haiyang Tian
IPC分类号： G02F1/16757 , G02F1/167 , G09G3/34 , G02F1/16766
CPC分类号： G02F1/16757 , G02F1/167 , G02F1/16766 , G09G3/344
摘要： Embodiments of the present disclosure provide an electronic paper, a display device, and a driving method. A plurality of first half-cup structures each includes charged dye particles with a single electric property are provided on the first driving backplane, a plurality of second half-cup structures each includes charged dye particles with a single electric property are provided on the second driving backplane; one first half-cup structure and the opposite second half-cup structures constitute a micro-cup structure, a electric property of the charged dye particles in the first half-cup structure is opposite to that in the second half-cup structure in the same micro-cup structure; a cross-sectional area of the respective second half-cup structures gradually decreases in a direction pointing from the second driving backplane to the first driving backplane; and a cross-sectional area of the respective first half-cup structures gradually decreases in an opposite direction.
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公开(公告)号：US10114283B2
公开(公告)日：2018-10-30
申请号：US15309008
申请日：2016-03-09
发明人： Pengyu Qi , Changjun Zha , Yanping Wang , Dong Wang , Jianfeng Yuan , Xibin Shao , Yan Zhang , Jintao Xiao , Yangchen Guo
摘要： The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate.
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