公开(公告)号：US20090311145A1

公开(公告)日：2009-12-17

申请号：US12437579

申请日：2009-05-08

申请人： Bo-Chen Wu ,  Tsung-Chih Chou ,  Jen-Yung Teng ,  Shyue-Jer Chern

发明人： Bo-Chen Wu ,  Tsung-Chih Chou ,  Jen-Yung Teng ,  Shyue-Jer Chern

IPC分类号： B01J19/00 ,  B05D1/32

CPC分类号： C23C14/564 ,  C23C4/01 ,  C23C4/11 ,  C23C4/18

摘要： In a reaction chamber for manufacturing semiconductor devices, flat displays, solar panels, a thermal spray ceramic coating with special geometric patterns is provided on structural parts in the reaction chamber. The geometric patterns of the ceramic coating are designed according to operating conditions in the reaction chamber, such as the energy source and the plasma producing gases being used, the intended plasma distribution and subsequent reactions in the reaction chamber, and compositions of the ceramic coating. To form the ceramic coating with special geometric patterns, a special masking process is adopted, and, after the forming of the ceramic coating with desired geometric patterns, a post grit blasting treatment is conducted to obtain a desired surface coarseness for the ceramic coating.

摘要翻译： 在用于制造半导体器件的反应室中，平面显示器，太阳能电池板，具有特殊几何图形的热喷涂陶瓷涂层提供在反应室中的结构部件上。 陶瓷涂层的几何图案根据反应室中的操作条件，例如所用能量源和产生等离子体的气体，反应室中预期的等离子体分布和随后的反应以及陶瓷涂层的组成来设计。 为了形成具有特殊几何图案的陶瓷涂层，采用特殊的掩模工艺，并且在以期望的几何图案形成陶瓷涂层之后，进行后喷砂处理以获得陶瓷涂层的期望的表面粗糙度。