公开(公告)号：US20080043917A1

公开(公告)日：2008-02-21

申请号：US11704894

申请日：2007-02-09

申请人： Boris Oreper ,  Richard Eilbert ,  Andrew Foland ,  Kenneth Prather ,  Thomas Plamondon

发明人： Boris Oreper ,  Richard Eilbert ,  Andrew Foland ,  Kenneth Prather ,  Thomas Plamondon

IPC分类号： H05G1/56

CPC分类号： G01V5/0025 ,  G01V5/005

摘要： A system may comprise a cathode, a target, one or more switches, and a conductive element. The cathode may be configured and arranged to generate an electron beam, and the target may be configured and arranged to emit radiation when electrons in the electron beam impact the target after being accelerated by an energy source. The one or more switches may be configured and arranged to apply either a first voltage or a second voltage from a power supply between the cathode and the target. The conductive element may be disposed between the cathode and the target so as to inhibit the electron beam generated by the cathode from reaching the target when a signal is applied to the conductive element.

摘要翻译： 系统可以包括阴极，靶，一个或多个开关和导电元件。 阴极可以被配置和布置成产生电子束，并且靶可以被配置和布置成当电子束中的电子在被能量源加速之后撞击靶时发射辐射。 一个或多个开关可以被配置和布置成施加来自阴极和靶之间的电源的第一电压或第二电压。 导电元件可以设置在阴极和靶之间，以便当信号被施加到导电元件时，抑制由阴极产生的电子束到达目标。