CEILING ELECTRODE WITH PROCESS GAS DISPERSERS HOUSING PLURAL INDUCTIVE RF POWER APPLICATORS EXTENDING INTO THE PLASMA
    1.
    发明申请
    CEILING ELECTRODE WITH PROCESS GAS DISPERSERS HOUSING PLURAL INDUCTIVE RF POWER APPLICATORS EXTENDING INTO THE PLASMA 有权
    带过程气体分离器的吸顶电极外壳电感式射频电源适配器扩展到等离子体

    公开(公告)号:US20090294065A1

    公开(公告)日:2009-12-03

    申请号:US12132133

    申请日:2008-06-03

    IPC分类号: C23F1/00

    CPC分类号: H01J37/321 H01J37/3244

    摘要: A gas distribution plate is formed of a metallic body having a bottom surface with plural gas disperser orifices and an internal gas manifold feeding the orifices. Each one of an array of discrete RF power applicators held in the plate includes (a) an insulating cylindrical housing extending through the plate, a portion of the housing extending outside of the plate through the bottom surface, and (b) a conductive solenoidal coil contained within the housing, a portion of the coil lying within the portion of the housing that extends outside of the plate through the bottom surface.

    摘要翻译: 气体分配板由具有多个气体分散器孔的底面的金属体和供给该孔的内部气体歧管形成。 保持在板中的分立RF功率施加器阵列中的每一个包括(a)延伸穿过板的绝缘圆柱形壳体,壳体的通过底表面延伸到板外部的部分,以及(b)导电螺线管线圈 所述线圈包含在所述壳体内,所述线圈的一部分位于所述壳体的通过所述底表面延伸到所述板外部的部分中。