专利检索 ap:("CHUBU ELECTRIC POWER CO., INC." OR "NISSAN TANAKA CORPORATION") AND inv:"Hideaki Shimizu" 第 1 页

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发明申请
HAFNIUM CARBIDE POWDER FOR PLASMA ELECTRODES, METHOD FOR PRODUCING SAME, HAFNIUM CARBIDE SINTERED BODY, AND PLASMA ELECTRODE 有权

公开(公告)号：US20220185677A1

公开(公告)日：2022-06-16

申请号：US17603075

申请日：2019-04-15

申请人： CHUBU ELECTRIC POWER CO., INC. , NISSAN TANAKA CORPORATION

发明人： Daisuke Ihara , Yoshimi Sano , Hirohumi Yoshimoto , Hideaki Shimizu , Hideaki Hashimoto , Akihiro Takeuchi , Kiyofumi Higashimoto

IPC分类号： C01B32/914 , H05H1/34 , C04B35/56

摘要： Hafnium carbide powder for plasma electrodes is represented by a chemical formula HfCx (where x=0.5 to 1.0). The content of carbon particles contained as impurities in the hafnium carbide powder is less than or equal to 0.03% by mass. The hafnium carbide powder preferably has an average particle size of 0.5 to 2 μm. To produce the hafnium carbide powder, a pellet made from mixed powder of hafnium oxide and carbon is first placed in a second crucible made of silicon carbide. Then, the hafnium carbide powder is formed by heating the second crucible at 1800 to 2000° C. with the second crucible arranged in a first crucible made of carbon.