RETUNING FOR IMPEDANCE MATCHING NETWORK CONTROL

    公开(公告)号:US20220189740A1

    公开(公告)日:2022-06-16

    申请号:US17685764

    申请日:2022-03-03

    IPC分类号: H01J37/32 H03H7/38 C23C14/54

    摘要: A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network receives the DC magnitude and phase error signals and varies an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive the variable tuning and load capacitors. In some cases, a blended mode (representing multiple tuning algorithms concurrently) may be implemented as a single mode that weights across what would have been multiple modes and thereby tunes the network using a weighted blended mode.

    Retuning for impedance matching network control

    公开(公告)号:US11290080B2

    公开(公告)日:2022-03-29

    申请号:US16768224

    申请日:2018-11-29

    IPC分类号: H03H7/38 H01J37/32

    摘要: A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network is configured to receive the DC magnitude and phase error signals and to vary an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive of the variable tuning and load capacitors.