WAX DEPOSIT REMOVAL USING AQUEOUS SURFACTANT

    公开(公告)号:US20210002540A1

    公开(公告)日:2021-01-07

    申请号:US16921100

    申请日:2020-07-06

    Abstract: A method and system for removing wax deposits from a wellbore and other oil production and processing equipment using a wax removal surfactant having at least 1% alkyl polyglycoside (APG), at least 0.5% ethoxylated alcohol (AE) or alcohol ethoxysulfates (AES), and at least 1% saturated alcohol, and optionally comprising D-Limonene, wherein the wax removal surfactant solution forms a Winsor Type III or Type IV microemulsion with water and wax.

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