公开(公告)号：US20240382895A1

公开(公告)日：2024-11-21

申请号：US18689666

申请日：2022-08-23

Applicant: CSK INC.

Inventor： Yun Soo Choi ,  Chan Kyoo Ko ,  Pil-Hyong Lee ,  Chun-Loon Cha ,  Jeong-Keun Lee ,  Ju Ha Kim ,  Hyun-A Shin

IPC: B01D53/00 ,  B01D53/76 ,  F28C1/08

Abstract: A facility for treating gas includes a flow channel providing a passage through which a waste gas flows; a thermal decomposition unit for thermally decomposing the waste gas flowing through the flow channel; a quencher for cooling the waste gas passed through the thermal decomposition unit to a predetermined temperature; and a cooling chamber in communication with the flow channel such that the waste gas passed through the quencher is introduced into the cooling chamber, the cooling chamber accommodating a solid material for cooling therewithin.