公开(公告)号：US20230142187A1

公开(公告)日：2023-05-11

申请号：US18153640

申请日：2023-01-12

Applicant: Carl Zeiss SMT GmbH

Inventor： Johannes Lippert ,  Toralf Gruner ,  Kerstin Hild ,  Hans-Michael Stiepan ,  Thilo Pollak ,  Jeffrey Cavaco

IPC: G03F7/20 ,  G02B13/16 ,  G02B26/08 ,  H10N30/80 ,  H10N30/20

CPC classification number: G03F7/70266 ,  G03F7/70891 ,  G02B13/16 ,  G02B26/0825 ,  H10N30/802 ,  H10N30/206

Abstract: A projection exposure apparatus comprises a projection objective, and the projection objective comprises an optical device, wherein the optical device comprises an optical element having an optically effective surface and an electrostrictive actuator. The electrostrictive actuator is deformable by a control voltage being applied. The electrostrictive actuator is functionally connected to the optical element to influence the surface shape of the optically effective surface. A control device supplies the electrostrictive actuator with the control voltage. A measuring device is configured, at least at times while the electrostrictive actuator influences the optically effective surface of the optical element, to measure directly and/or to determine indirectly the temperature and/or a temperature change of the electrostrictive actuator and/or the surroundings thereof to take account of a temperature-dependent influence during driving of the electrostrictive actuator by the control device.