公开(公告)号：US20120181181A1

公开(公告)日：2012-07-19

申请号：US12930754

申请日：2011-01-14

申请人： Chao-Peng Cheng ,  Chih-I Yang ,  Jas Chudasama ,  William Stokes ,  Chien-Li Lin ,  David Wagner

发明人： Chao-Peng Cheng ,  Chih-I Yang ,  Jas Chudasama ,  William Stokes ,  Chien-Li Lin ,  David Wagner

IPC分类号： G11B5/187 ,  B08B7/00

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3163

摘要： A method of removing an alumina layer around a main pole layer during perpendicular magnetic recording head fabrication is disclosed. The alumina etch sequence includes immersing a substrate in a series of aqueous solutions purged with an inert gas to remove oxygen thereby avoiding corrosion of the main pole. Initially, the substrate is soaked and heated in deionized (DI) water. Once heated, the substrate is immersed in an etching bath at about 80° C. and pH 10.5. Bath chemistry is preferably based on Na2CO3 and NaHCO3, and N2 purging improves etch uniformity and reduces residue. Thereafter, the substrate is rinsed in a second DI water bath between room temperature and 80° C., and finally subjected to a quick dump rinse before drying. Inert gas, preferably N2, may be introduced into the aqueous solutions through a purge board having a plurality of openings and positioned proximate to the bottom of a bath container.

摘要翻译： 公开了一种在垂直磁记录头制造期间去除主极层周围的氧化铝层的方法。 氧化铝蚀刻顺序包括将衬底浸入用惰性气体吹扫的一系列水溶液中以除去氧气，从而避免主极的腐蚀。 最初，将基底浸泡并在去离子（DI）水中加热。 一旦加热，将基底浸入约80℃和pH 10.5的蚀刻浴中。 浴化学优选基于Na 2 CO 3和NaHCO 3，并且N 2吹扫改善蚀刻均匀性并减少残余物。 此后，将基板在室温至80℃的第二DI水浴中冲洗，最后在干燥前进行快速倾倒冲洗。 可以通过具有多个开口并且靠近浴容器的底部定位的吹扫板将惰性气体，优选N 2引入水溶液中。

公开(公告)号：US08603348B2

公开(公告)日：2013-12-10

申请号：US12930754

申请日：2011-01-14

申请人： Chao-Peng Cheng ,  Chih-I Yang ,  Jas Chudasama ,  William Stokes ,  Chien-Li Lin ,  David Wagner

发明人： Chao-Peng Cheng ,  Chih-I Yang ,  Jas Chudasama ,  William Stokes ,  Chien-Li Lin ,  David Wagner

IPC分类号： H01L21/302 ,  H01L21/461 ,  B44C1/22 ,  C23F1/00 ,  C03C15/00 ,  C03C25/68

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3163

摘要： A method of removing an alumina layer around a main pole layer during perpendicular magnetic recording head fabrication is disclosed. The alumina etch sequence includes immersing a substrate in a series of aqueous solutions purged with an inert gas to remove oxygen thereby avoiding corrosion of the main pole. Initially, the substrate is soaked and heated in deionized (DI) water. Once heated, the substrate is immersed in an etching bath at about 80° C. and pH 10.5. Bath chemistry is preferably based on Na2CO3 and NaHCO3, and N2 purging improves etch uniformity and reduces residue. Thereafter, the substrate is rinsed in a second DI water bath between room temperature and 80° C., and finally subjected to a quick dump rinse before drying. Inert gas, preferably N2, may be introduced into the aqueous solutions through a purge board having a plurality of openings and positioned proximate to the bottom of a bath container.

摘要翻译： 公开了一种在垂直磁记录头制造期间去除主极层周围的氧化铝层的方法。 氧化铝蚀刻顺序包括将衬底浸入用惰性气体吹扫的一系列水溶液中以除去氧气，从而避免主极的腐蚀。 最初，将基底浸泡并在去离子（DI）水中加热。 一旦加热，将基底浸入约80℃和pH 10.5的蚀刻浴中。 浴化学优选基于Na 2 CO 3和NaHCO 3，并且N 2吹扫改善蚀刻均匀性并减少残余物。 此后，将基板在室温至80℃的第二DI水浴中冲洗，最后在干燥前进行快速倾倒冲洗。 可以通过具有多个开口并且靠近浴容器的底部定位的吹扫板将惰性气体，优选N 2引入水溶液中。