Halide ion-selective devices and method
    1.
    发明授权
    Halide ion-selective devices and method 失效
    卤化物离子选择装置及方法

    公开(公告)号:US4199412A

    公开(公告)日:1980-04-22

    申请号:US956527

    申请日:1978-10-31

    IPC分类号: G01N27/333 G01N27/46

    CPC分类号: G01N27/3335

    摘要: Halide ion-sensitive devices and methods for their use are described. The devices contain a halide ion-permeable overlayer which is superposed on a layer of silver halide and meets certain criteria of thickness and permeability and/or certain compositional criteria. The methods involve bringing a portion of a solution to be analyzed into contact with the halide ion-permeable overlayer and, within a selected time thereafter, measuring the difference in potential between the portion of solution and the silver halide layer.

    摘要翻译: 描述了卤化物离子敏感器件及其使用方法。 这些装置含有卤化物离子可渗透的覆层,其叠加在一层卤化银上并满足一定的厚度和渗透性标准和/或某些组成标准。 所述方法包括使待分析溶液的一部分与卤离子可透过的覆盖层接触,并且在此后的选定时间内测量溶液部分与卤化银层之间的电位差。