公开(公告)号：US06209429B1

公开(公告)日：2001-04-03

申请号：US09344862

申请日：1999-06-28

申请人： Charles J. Urso, III ,  Thomas M. Wilbert ,  Charles R. VanCassele ,  James A. Hirliman ,  Michael A. McManus ,  Garry O. Glanzel ,  Richard B. Duong ,  Sidney L. McCoy

发明人： Charles J. Urso, III ,  Thomas M. Wilbert ,  Charles R. VanCassele ,  James A. Hirliman ,  Michael A. McManus ,  Garry O. Glanzel ,  Richard B. Duong ,  Sidney L. McCoy

IPC分类号： B23B100

CPC分类号： B23B1/00 ,  Y10S82/901 ,  Y10T82/10 ,  Y10T82/16065 ,  Y10T82/16098

摘要： A process including providing a hollow cvlindrical substrate, the substrate having a dry outer surface describing a curvilinear plane, a dry inner surface describing a curvilinear plane, a first end opposite a second end, and an imaginary axis extending from the first end to the second end, supporting the substrate, machining at least a portion of at least one end of the substrate with at least one dry polycrystalline diamond cutting tool in the absence of liquids to remove material from the substrate, and simultaneously maintaining, during machining, the dry inner surface of the cylindrical substrate free of the material machined from the at least one end of the substrate by the at least one dry polycrystalline diamond cutting tool.

摘要翻译： 一种方法，包括提供中空圆柱形基底，所述基底具有描述曲线平面的干燥外表面，描述曲线平面的干内表面，与第二端相对的第一端和从第一端延伸到第二端的假想轴 端部，支撑基底，在没有液体的情况下用至少一个干多晶金刚石切割工具来加工基底的至少一个端部的至少一部分以从基底去除材料，同时在加工期间保持干内 所述圆柱形基底的表面没有由所述至少一个干多晶金刚石切割工具从所述基底的所述至少一个端部加工的材料。