公开(公告)号：US08049213B2

公开(公告)日：2011-11-01

申请号：US11958942

申请日：2007-12-18

申请人： Ching-Chung Su ,  Yi-Wei Chiu ,  Tzu Chan Weng ,  Yih Song Chiu ,  Pin Chia Su ,  Chih-Cherng Jeng ,  Kuo-Hsiu Wei

发明人： Ching-Chung Su ,  Yi-Wei Chiu ,  Tzu Chan Weng ,  Yih Song Chiu ,  Pin Chia Su ,  Chih-Cherng Jeng ,  Kuo-Hsiu Wei

IPC分类号： H01L21/66 ,  H01L23/544

CPC分类号： H01L22/14 ,  H01L22/12 ,  H01L22/20

摘要： A method of measuring dimensional characteristics includes providing a substrate and forming a reflective layer over the substrate. A dielectric layer is then formed over the reflective layer. The dielectric layer includes a grating pattern and a resistivity test line inset in a transparent region. Radiation is then directed onto the dielectric layer so that some of the radiation is transmitted through the transparent region to the reflective layer. A radiation pattern is then detected from the radiation reflected and scattered by the metal grating pattern. The radiation pattern is analyzed to determine a first dimensional information. Then the resistance of the resistivity test line is measured, and that resistance is analyzed to determine a second dimensional information. The first and second dimensional informations are then compared.

摘要翻译： 测量尺寸特性的方法包括提供衬底并在衬底上形成反射层。 然后在反射层上形成电介质层。 电介质层包括在透明区域内插入的光栅图案和电阻率测试线。 然后将辐射引导到电介质层上，使得一些辐射透过透明区域到达反射层。 然后从由金属光栅图案反射和散射的辐射中检测出辐射图。 分析辐射图以确定第一维信息。 然后测量电阻率测试线的电阻，并分析该电阻以确定第二维信息。 然后比较第一和第二维信息。