公开(公告)号：US06187080B1

公开(公告)日：2001-02-13

申请号：US09370487

申请日：1999-08-09

申请人： Chung Ping-Chung ,  Lu Tsung-Lin ,  Chi-Hsien Chen ,  Jing-Yi Huang ,  Ju-Long Lee ,  Hunter Chung ,  Chien-Feng Chen

发明人： Chung Ping-Chung ,  Lu Tsung-Lin ,  Chi-Hsien Chen ,  Jing-Yi Huang ,  Ju-Long Lee ,  Hunter Chung ,  Chien-Feng Chen

IPC分类号： B01D5314

CPC分类号： B01D46/0065 ,  B01D53/68 ,  B01D53/74 ,  B01D2257/204 ,  B08B9/00 ,  C23C16/4412 ,  Y02C20/30

摘要： An exhaust gas treatment apparatus for treating exhaust gas generated in semiconductor manufacturing processes. It includes a main pipe, a gas vortex means, a water vortex means, an U pipe and a discharge pipe. The main pipe transforms the exhaust gases to waste powder which are discharged out through the U pipe and the discharge pipe. The gas vortex means and water vortex means are located below the main pipe for generating annular and even downward gas flow and water flow at the outlet of the main pipe for preventing reflux of waste powder from entering into the main pipe. Waste powder thus won't deposit around the outlet. Scraper in the main pipe won't be stuck or deformed. Waste powder may be discharged out through the U pipe and discharge pipe smoothly and efficiently.

摘要翻译： 一种用于处理在半导体制造工艺中产生的废气的排气处理装置。 它包括主管，气体涡流装置，水涡流装置，U型管和排放管。 主管将废气转换成通过U管和排放管排出的废粉。 气体涡流装置和水涡流装置位于主管下方，用于在主管出口处产生环形和均匀的向下气流和水流，以防止废粉回流进入主管。 因此，废粉不会在出口附近沉积。 主管中的刮刀不会卡住或变形。 废粉可以通过U型管和排水管顺畅，高效地排出。