公开(公告)号：US20210362132A1

公开(公告)日：2021-11-25

申请号：US17398150

申请日：2021-08-10

Applicant: Coretech Co., Ltd. ,  Samsung Electronics Co., Ltd.

Inventor： Young Hwan Moon ,  Jong San Kim ,  Heon Jung ,  Eun Seo Park ,  Deung Ki Yun ,  Sun Choi ,  Seung Youn Jung ,  Jun Min Yeom

IPC: B01J23/755 ,  B01J23/30 ,  B01J6/00 ,  B01J37/02 ,  B01J37/03 ,  B01J37/04

Abstract: A catalyst for decomposing perfluorinated compounds is composed of tungsten (W) compound and nickel (Ni) compound as main components and composed of aluminum (Al) compound or silicon (Si) compound as a supporter.

公开(公告)号：US20200222885A1

公开(公告)日：2020-07-16

申请号：US16597927

申请日：2019-10-10

Applicant: Coretech Co., Ltd.

Inventor： Young Hwan Moon ,  Jong San Kim ,  Heon Jung ,  Eun Seo Park ,  Deung Ki Yun ,  Sun Choi ,  Seung Youn Jung ,  Jun Min Yeom

IPC: B01J23/755 ,  B01J23/30 ,  B01J37/04 ,  B01J37/02 ,  B01J37/03 ,  B01J6/00

Abstract: A catalyst for decomposing perfluorinated compounds is composed of tungsten (W) and nickel (Ni) as main components and composed of aluminum (Al) or silicon (Si) as a supporter.

公开(公告)号：US20240082785A1

公开(公告)日：2024-03-14

申请号：US18243931

申请日：2023-09-08

Applicant: CORE TECH CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dooboem Kim ,  Jong San Kim ,  Young Hwan Moon ,  Deungki Yun ,  Eun Seo Park ,  Jun Min Yeom ,  Heon Jung ,  Sungwon Hong

IPC: B01D53/86 ,  C04B35/10 ,  C04B35/622 ,  C04B35/64

CPC classification number: B01D53/8668 ,  C04B35/10 ,  C04B35/62222 ,  C04B35/64 ,  B01D2257/70 ,  C04B2235/3217 ,  C04B2235/3225 ,  C04B2235/9607

Abstract: A heat storage body for a regenerative catalytic apparatus is provided, the heat storage body includes: a body unit including a ceramic sintered body containing aluminum oxide, silica, and magnesium oxide, the body unit having a plurality of channels connecting first and second surfaces, located opposite to each other. The heat storage body further including a protective film disposed on a surface of the body unit and inner surfaces of the plurality of channels. The protective film includes an oxide containing a first metal of aluminum and at least one second metal including at least one from among yttrium, zinc, zirconium, tungsten, zinc, and nickel.