公开(公告)号：US08436984B2

公开(公告)日：2013-05-07

申请号：US12639744

申请日：2009-12-16

申请人： Cornelis Lambertus Maria Van Weert ,  Marcus Adrianus Van De Kerkhof ,  Bearrach Moest

发明人： Cornelis Lambertus Maria Van Weert ,  Marcus Adrianus Van De Kerkhof ,  Bearrach Moest

IPC分类号： G03B27/72 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70066

摘要： A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross-section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.

摘要翻译： 公开了一种光刻设备，其包括桌子，桌子上的至少两个目标部分或桌子上的物体上的至少两个目标部分以及该至少两个目标部分之间的表面材料。 该装置还包括一个光学系统，该光学系统配置成沿着光学路径朝向桌子投射辐射束，同时具有同时照射至少两个目标部分的横截面。 该装置还包括可移动到光路中的屏蔽物，以限制辐射束的横截面以限制至少两个目标部分之间的照明，其中当辐射照射时，至少两个目标部分之间的表面材料会降解 从光学系统。