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公开(公告)号:US11300030B2
公开(公告)日:2022-04-12
申请号:US16324485
申请日:2018-08-14
发明人: Samuel Johnson , Ryan M. Johnson , Kartiki Jagtap , Enoch Nanduru , Mahendra Mittapalli , Udit Bhaveshkumar Shah , Suraj D. Khalate , Pradnya Chandrakant Joshi , Vinay Kumar Joshi , Vaidyanadan Sundaram
摘要: A decomposition chamber for an aftertreatment system includes: a body including: an inlet configured to receive exhaust gas; an outlet configured to expel the exhaust gas, a thermal management chamber in fluid communication with the inlet, the thermal management chamber configured to receive a first portion of the exhaust gas from the inlet, and a main flow chamber in fluid communication with the inlet, the main flow chamber configured to receive a second portion of the exhaust gas from the inlet and to receive the first portion of the exhaust gas from the thermal management chamber; and a diffuser positioned within the main flow chamber, the diffuser including: a diffuser inlet portion including a plurality of diffuser perforations, the diffuser inlet portion configured to receive the exhaust gas from the main flow chamber, and a diffuser flange portion configured to receive the exhaust gas from the diffuser inlet portion and provide the exhaust gas to the outlet.
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公开(公告)号:US20220186651A1
公开(公告)日:2022-06-16
申请号:US17688281
申请日:2022-03-07
发明人: Samuel Johnson , Ryan M. Johnson , Kartiki Jagtap , Enoch Nanduru , Mahendra Mittapalli , Udit Bhaveshkumar Shah , Suraj D. Khalate , Pradnya Chandrakant Joshi , Vinay Kumar Joshi , Vaidyanadan Sundaram
摘要: A decomposition chamber for an aftertreatment system includes: a body comprising: an inlet configured to receive exhaust gas, an outlet configured to expel the exhaust gas, a thermal management chamber in fluid communication with the inlet, the thermal management chamber configured to receive an exhaust gas first portion from the inlet, an exhaust assist chamber in fluid communication with the inlet, the exhaust assist chamber configured to receive an exhaust gas second portion from the inlet, and a main flow chamber in fluid communication with the inlet, the main flow chamber configured to receive an exhaust gas third portion from the inlet, receive the exhaust gas first portion from the thermal management chamber, and receive the exhaust gas second portion from the exhaust assist chamber.
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公开(公告)号:US11560821B2
公开(公告)日:2023-01-24
申请号:US17688281
申请日:2022-03-07
发明人: Samuel Johnson , Ryan M. Johnson , Kartiki Jagtap , Enoch Nanduru , Mahendra Mittapalli , Udit Bhaveshkumar Shah , Suraj D. Khalate , Pradnya Chandrakant Joshi , Vinay Kumar Joshi , Vaidyanadan Sundaram
摘要: A decomposition chamber for an aftertreatment system includes: a body comprising: an inlet configured to receive exhaust gas, an outlet configured to expel the exhaust gas, a thermal management chamber in fluid communication with the inlet, the thermal management chamber configured to receive an exhaust gas first portion from the inlet, an exhaust assist chamber in fluid communication with the inlet, the exhaust assist chamber configured to receive an exhaust gas second portion from the inlet, and a main flow chamber in fluid communication with the inlet, the main flow chamber configured to receive an exhaust gas third portion from the inlet, receive the exhaust gas first portion from the thermal management chamber, and receive the exhaust gas second portion from the exhaust assist chamber.
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公开(公告)号:US20210332733A1
公开(公告)日:2021-10-28
申请号:US16324485
申请日:2018-08-14
发明人: Samuel Johnson , Ryan M. Johnson , Kartiki Jagtap , Enoch Nanduru , Mahendra Mittapalli , Udit Bhaveshkumar Shah , Suraj D. Khalate , Pradnya Chandrakant Joshi , Vinay Kumar Joshi , Vaidyanadan Sundaram
摘要: A decomposition chamber for an aftertreatment system includes a body and a diffuser. The body includes an inlet, an outlet, a thermal management chamber, and a main flow chamber. The inlet is configured to receive exhaust gas. The outlet is configured to expel the exhaust gas. The thermal management chamber is in fluid communication with the inlet. The thermal management chamber is configured to receive an exhaust gas first portion from the inlet. The main flow chamber is in fluid communication with the inlet. The main flow chamber is configured to receive an exhaust gas second portion from the inlet and to receive the exhaust gas first portion from the thermal management chamber. The diffuser is positioned within the main flow chamber. The diffuser includes a diffuser inlet portion and a diffuser flange portion. The diffuser inlet portion includes a plurality of diffuser perforations.
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