专利检索 ap:("Dana Gronbeck" OR "Amy Kwok" OR "Chi Truong" OR "Michael Gallagher" OR "Anthony Zampini") AND inv:"Amy Kwok" 第 1 页

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发明申请
Antireflective hard mask compositions 有权
标题翻译：抗反射硬掩模组合物

公开(公告)号：US20070057253A1

公开(公告)日：2007-03-15

申请号：US11512140

申请日：2006-08-29

申请人： Dana Gronbeck , Amy Kwok , Chi Truong , Michael Gallagher , Anthony Zampini

发明人： Dana Gronbeck , Amy Kwok , Chi Truong , Michael Gallagher , Anthony Zampini

IPC分类号： H01L51/00 , H01L21/31

CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081

摘要： The invention includes new organic-containing compositions that can finction as. an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.

摘要翻译： 本发明包括新的含有机物的组合物，其可以作为。用于外涂光致抗蚀剂的抗反射层。通过从底涂层显示出足够的等离子体蚀刻选择性，本发明的组合物也可有效地用作硬掩模层。本发明的优选组合物具有高Si含量并且包含不同树脂的共混物。