Phosphor screen for MEMS image intensifiers

    公开(公告)号:US10923244B2

    公开(公告)日:2021-02-16

    申请号:US15827956

    申请日:2017-11-30

    Abstract: A phosphor screen for a Micro-Electro-Mechanical-Systems (MEMS) image intensifier includes a wafer structure, a lattice of interior walls, a thin film phosphor layer, and a reflective metal layer. The wafer structure has a naturally opaque top layer and an active area defined within the naturally opaque top layer. The lattice of interior walls is formed, within the active area, from the naturally opaque top layer. The thin film phosphor layer is disposed in the active area, between the lattice of interior walls. The reflective metal layer that is disposed atop the thin film phosphor layer. In at least some instances, the thin film phosphor layer is a non-particle phosphor layer.

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