公开(公告)号：US12233377B2

公开(公告)日：2025-02-25

申请号：US17441499

申请日：2020-03-24

Applicant: ENEOS CORPORATION

Inventor： Kazumi Maehara ,  Daisaku Tateishi ,  Motoyoshi Fukuoka ,  Tadashi Seike

IPC: B01D53/04 ,  B01J20/28 ,  B01J20/34 ,  C01B3/56 ,  F17C5/06

Abstract: A hydrogen gas supply apparatus includes a compressor configured to compress hydrogen gas and supply the compressed hydrogen gas toward a pressure accumulator which accumulates the hydrogen gas, a first adsorption column disposed between the discharge port of the compressor and the pressure accumulator and configured to include the first adsorbent for adsorbing impurities in the hydrogen gas discharged from the compressor, a first valve disposed between the discharge port of the compressor and the gas inlet port of the first adsorption column, a second valve disposed between the gas outlet port of the first adsorption column and the pressure accumulator, a return pipe configured to branch from between the first valve and the gas inlet port of the adsorption column and connect to the suction side of the compressor, and a second adsorption column disposed in the middle of the return pipe.