公开(公告)号：US20210009452A1

公开(公告)日：2021-01-14

申请号：US16948738

申请日：2020-09-30

Applicant: ECOLAB USA INC.

Inventor： LEE J. MONSRUD ,  XIN SUN ,  KRISTEN MILLS ,  DOUGLAS J. PRIDEAUX ,  BETH E. BENSON ,  KIM R. SOLOMON ,  KEITH E. OLSON

IPC: C02F5/10 ,  C02F1/72 ,  C02F1/52 ,  C02F1/42 ,  E03B7/07 ,  C02F5/02

Abstract: The present invention is related to methods, apparatuses, and compositions for controlling water hardness. The methods, apparatuses and compositions also reduce scale formation. The present invention includes substantially water insoluble resin materials. The resin materials may be loaded with a plurality of cations.

公开(公告)号：US20200331786A1

公开(公告)日：2020-10-22

申请号：US16946193

申请日：2020-06-09

Applicant: ECOLAB USA INC.

Inventor： LEE J. MONSRUD ,  XIN SUN ,  KRISTEN MILLS ,  DOUGLAS J. PRIDEAUX ,  BETH E. BENSON ,  KIM R. SOLOMON ,  KEITH E. OLSON

IPC: C02F5/10 ,  C02F1/72 ,  C02F1/52 ,  C02F1/42 ,  E03B7/07 ,  C02F5/02

Abstract: The present invention is related to methods, apparatuses, and compositions for controlling water hardness. The methods, apparatuses and compositions also reduce scale formation. The present invention includes substantially water insoluble resin materials. The resin materials may be loaded with a plurality of cations.

公开(公告)号：US20180100126A1

公开(公告)日：2018-04-12

申请号：US15840944

申请日：2017-12-13

Applicant: Ecolab USA Inc.

Inventor： MICHAEL S. RISCHMILLER ,  KIM R. SOLOMON ,  SARA PETERS ,  STEVEN E. LENTSCH

IPC: C11D3/386 ,  C11D3/00

CPC classification number: C11D3/38618 ,  C11D3/0042

Abstract: A cleaning composition is provided including an alkalinity source, builder, surfactant, water, a reducing agent and amylase in the ratio of from about 1:1 to about 1:3 wherein the total amount of amylase in the composition is equal to or less than about 1.0 weight percent; and wherein the composition is substantially free of polyols, alkanolamine, phosphates, and boric acid. A method of presoaking soiled substrates is further provided. The method including the steps of providing presoak solution to a soiled substrate at a temperature of between about 65.5° C. up to about 80° C., the presoak solution including the provided composition; draining the presoak solution from the substrate; providing a detergent to a soiled substrate including the composition of the present invention; and removing or draining the detergent; and rinsing the substrate with water.