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公开(公告)号:US11912673B2
公开(公告)日:2024-02-27
申请号:US17235142
申请日:2021-04-20
IPC分类号: C07D257/10 , C07D487/06
CPC分类号: C07D257/10 , C07D487/06
摘要: A process for preparing a tetra-substituted aminobiphenol macrocyclic ligand having the structure (I), including the step of treating a precursor compound having the structure (II) with a compound having the structure R6-L where L is a leaving group (hereafter compound (III)) in the presence of a base.
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公开(公告)号:US20210238149A1
公开(公告)日:2021-08-05
申请号:US17235142
申请日:2021-04-20
IPC分类号: C07D257/10 , C07D487/06
摘要: A process for preparing a tetra-substituted aminobiphenol macrocyclic ligand having the structure (I), including the step of treating a precursor compound having the structure (II) with a compound having the structure R6-L where L is a leaving group (hereafter compound (III)) in the presence of a base.
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3.
公开(公告)号:US20190382357A1
公开(公告)日:2019-12-19
申请号:US16487939
申请日:2018-03-02
IPC分类号: C07D257/10 , C07D487/06
摘要: A process for preparing a tetra-substituted aminobiphenol macrocyclic ligand having the structure (I), comprising the step of treating a precursor compound having the structure (II) with a compound having the structure R6-L where L represents a leaving group (hereinafter compound (III)) in the presence of a base.
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4.
公开(公告)号:US20240182432A1
公开(公告)日:2024-06-06
申请号:US18421022
申请日:2024-01-24
IPC分类号: C07D257/10 , C07D487/06
CPC分类号: C07D257/10 , C07D487/06
摘要: A process for preparing a tetra-substituted aminobiphenol macrocyclic ligand having the structure (I), including the step of treating a precursor compound having the structure (II) with a compound having the structure R6-L where L is a leaving group (hereafter compound (III)) in the presence of a base.
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公开(公告)号:US11014894B2
公开(公告)日:2021-05-25
申请号:US16487939
申请日:2018-03-02
IPC分类号: C07D257/10 , C07D487/06
摘要: A process for preparing a tetra-substituted aminobiphenol macrocyclic ligand having the structure (I), comprising the step of treating a precursor compound having the structure (II) with a compound having the structure R6-L where L represents a leaving group (hereinafter compound (III)) in the presence of a base.
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