公开(公告)号：US20230341761A1

公开(公告)日：2023-10-26

申请号：US18033721

申请日：2021-10-26

Applicant: Edgehog Advanced Technologies Inc.

Inventor： Chia-hung Calvin Cheng ,  Fabien Paul Jacques Dauzou ,  Siamak Kashi ,  Nasim Sahraei Khanghah

IPC: G03F1/46 ,  G03F1/80 ,  B82Y20/00 ,  B82B3/00

CPC classification number: G03F1/46 ,  G03F1/80 ,  B82Y20/00 ,  B82B3/0014 ,  B82B3/0057 ,  B82B3/0066

Abstract: An anti-reflective article includes a substrate including a surface and a bulk, and an arrangement of anti-reflective nanostructures along the surface of the substrate, each anti-reflective nanostructure of the arrangement of anti-reflective nanostructures being supported by the bulk of the substrate, each anti-reflective nanostructure of the arrangement of anti-reflective nanostructure tapering from the bulk of the substrate to define a respective peak. At least some of the anti-reflective nanostructures of the arrangement of anti-reflective nanostructures are linked with an adjacent anti-reflective nanostructure of the arrangement of anti-reflective nanostructures via a respective interconnection. The respective interconnections are in addition to the bulk of the substrate supporting the anti-reflective nanostructures. The respective interconnections are disposed at or above a midpoint between the peaks of the anti-reflective nanostructures and the bulk of the substrate.