公开(公告)号：US20170261662A1

公开(公告)日：2017-09-14

申请号：US15413293

申请日：2017-01-23

Applicant: Electronics and Telecommunications Research Institute

Inventor： Seung Youl LEE ,  Yong Hae KIM ,  Tae-Youb KIM ,  Seong-Mok CHO ,  Han Byeol KANG ,  Hanna KIM ,  Chi-Sun HWANG

IPC: G02B5/18 ,  G02B27/00

CPC classification number: G02B5/1828 ,  G02B5/1847 ,  G02B5/1861

Abstract: Provided is an optical device manufacturing method including forming a reflection layer on a substrate, forming a dielectric layer on the reflection layer, and inserting a phase change material layer into the dielectric layer, wherein the inserting of the phase change material layer includes adjusting a position of the phase change material layer to be inserted into the dielectric layer according to a wavelength of incident light incident to the dielectric layer.