METHOD OF DEPOSITING TANTALUM TO FORM A TANTALUM COATING
    3.
    发明申请
    METHOD OF DEPOSITING TANTALUM TO FORM A TANTALUM COATING 审中-公开
    沉积钨酸盐以形成钨酸盐涂料的方法

    公开(公告)号:US20160108512A1

    公开(公告)日:2016-04-21

    申请号:US14271903

    申请日:2014-05-07

    IPC分类号: C23C10/28 B32B15/01 C23C10/02

    摘要: A method of depositing tantalum to form a tantalum coating on substrates is provided. The method comprises preparing a tantalum-containing mixture having a tantalum donor, a halide activator, and a tantalum halide activator; preparing a substrate for deposition of the tantalum from the tantalum-containing mixture; and heating the substrate and the tantalum-containing mixture to a given temperature to deposit the tantalum on the substrate.

    摘要翻译: 提供了一种沉积钽以在衬底上形成钽涂层的方法。 该方法包括制备具有钽供体,卤化物活化剂和卤化钽活化剂的含钽混合物; 制备用于从含钽混合物中沉积钽的衬底; 并将衬底和含钽混合物加热至给定温度以将钽沉积在衬底上。