公开(公告)号：US06803160B2

公开(公告)日：2004-10-12

申请号：US10317565

申请日：2002-12-12

申请人： Eric V. Johnstone ,  Franklin D. Kalk

发明人： Eric V. Johnstone ,  Franklin D. Kalk

IPC分类号： G03F900

CPC分类号： G03F1/50

摘要： A multi-tone photomask and method for manufacturing the same are disclosed. A photomask includes a filter layer formed on at least a portion of a substrate. The filter layer includes a first pattern formed by a first etch process. A barrier layer including the first pattern is formed on at least a portion of the filter layer by a second etch process. An absorber layer including a second pattern is formed on at least a portion of the barrier layer by a third etch process. The barrier layer further acts as an etch stop for the third etch process.

摘要翻译： 公开了一种多色调光掩模及其制造方法。 光掩模包括形成在基板的至少一部分上的过滤层。 滤光层包括通过第一蚀刻工艺形成的第一图案。 通过第二蚀刻工艺在过滤层的至少一部分上形成包括第一图案的阻挡层。 通过第三蚀刻工艺在阻挡层的至少一部分上形成包括第二图案的吸收层。 阻挡层还用作第三蚀刻工艺的蚀刻停止。