公开(公告)号：US20240279801A1

公开(公告)日：2024-08-22

申请号：US18441940

申请日：2024-02-14

申请人： Eugenus, Inc.

发明人： Chong Jiang ,  Vinay Shankar Vidyarthi ,  H. William Lucas, JR. ,  Jose A. Palencia ,  Francisco Z. Araiza

IPC分类号： C23C16/44 ,  B01D46/00 ,  B01D46/84 ,  C23C16/455

CPC分类号： C23C16/4402 ,  B01D46/0087 ,  B01D46/84 ,  C23C16/4408 ,  C23C16/45544 ,  B01D2273/10

摘要： The disclosed technology relates generally to semiconductor manufacturing, and more particularly to precursor delivery in cyclic deposition. In one aspect, a thin film deposition system comprises a thin film deposition chamber configured to deposit a thin film. The thin film system additionally comprises a precursor source connected to the thin film deposition chamber by a precursor delivery line, wherein the precursor delivery line comprises a filter connected to the precursor source via a first valve, and a by-pass line connected to the precursor source via a second valve.