公开(公告)号：US20240210826A1

公开(公告)日：2024-06-27

申请号：US18586593

申请日：2024-02-26

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Shuhei YAMAGUCHI ,  Tomoaki YOSHIOKA ,  Eiji FUKUZAKI ,  Yuka KAMINO

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition including: a resin (A) that is decomposed by the action of an acid and thereby increased in polarity; and a compound (C) that generates an acid upon irradiation with actinic rays or radiation and that is represented by a specific formula. The resin (A) includes a specific repeating unit represented by specific general formula (AI).