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公开(公告)号:US20240210826A1
公开(公告)日:2024-06-27
申请号:US18586593
申请日:2024-02-26
Applicant: FUJIFILM Corporation
Inventor: Taro MIYOSHI , Shuhei YAMAGUCHI , Tomoaki YOSHIOKA , Eiji FUKUZAKI , Yuka KAMINO
IPC: G03F7/004
CPC classification number: G03F7/0045
Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition including: a resin (A) that is decomposed by the action of an acid and thereby increased in polarity; and a compound (C) that generates an acid upon irradiation with actinic rays or radiation and that is represented by a specific formula. The resin (A) includes a specific repeating unit represented by specific general formula (AI).