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公开(公告)号：US11281008B2
公开(公告)日：2022-03-22
申请号：US16870545
申请日：2020-05-08
发明人： Ying Geng , Jacques Gollier , Alexander Sohn , Matthew E. Colburn
IPC分类号： G02B27/01 , H04N13/332 , H01L27/32 , H04N13/344 , H04N13/324
摘要： An electronic display assembly includes a display element and a corrective element coupled to the display element. The display element has a first plurality of sub-pixels of a first type and a second plurality of sub-pixels of a second type. Two adjacent sub-pixels of the first plurality of sub-pixel are separated by a sub-pixel distance. The corrective element has a plurality of features configured to diffuse light emitted by the first plurality of sub-pixels such that an apparent distance between the two adjacent sub-pixels of the first type, viewed at a viewing distance away from the electronic display assembly, is less than the sub-pixel distance.
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公开(公告)号：US20210294006A1
公开(公告)日：2021-09-23
申请号：US17344016
申请日：2021-06-10
发明人： Matthew E. Colburn , Giuseppe Calafiore , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty
摘要： A manufacturing system for fabricating self-aligned grating elements with a variable refractive index includes a patterning system, a deposition system, and an etching system. The manufacturing system performs a lithographic patterning of one or more photoresists to create a stack over a substrate. The manufacturing system performs a conformal deposition of a protective coating on the stack. The manufacturing system performs a deposition of a first photoresist of a first refractive index on the protective coating. The manufacturing system performs a removal of the first photoresist to achieve a threshold value of first thickness. The manufacturing system performs a deposition of a second photoresist of a second refractive index on the first photoresist. The second refractive index is greater than the first refractive index. The manufacturing system performs a removal of the second photoresist to achieve a threshold value of second thickness to form a portion of an optical grating.
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公开(公告)号：US10996382B1
公开(公告)日：2021-05-04
申请号：US15878230
申请日：2018-01-23
摘要： An optical device with a variable index of refraction is formed by exposing a film to an energy gradient. The optical device has angular selectivity. The optical device can be used as an output coupler for a waveguide used in a virtual-reality and/or augmented-reality apparatus.
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公开(公告)号：US10712670B1
公开(公告)日：2020-07-14
申请号：US16686241
申请日：2019-11-18
摘要： A method comprises disposing a photosensitive film layer on a surface of a substrate layer and placing a variable neutral density (ND) filter such that a surface of the variable ND filter faces an exposure region of the photosensitive film layer. The variable ND filter is a thin film that has an attenuation profile that modulates transmittance of light passing through the variable ND filter to the exposure region to cancel out an uneven power distribution in an intermediate interference exposure pattern at the exposure region of the photosensitive film layer. The method further comprises arranging one or more laser generators such that at least two generated beams of light from the one or more laser generators intersect with each other and form the intermediate interference exposure pattern that is modulated by the variable ND filter to form a target interference exposure pattern at the exposure region.
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公开(公告)号：US20190324176A1
公开(公告)日：2019-10-24
申请号：US15960308
申请日：2018-04-23
发明人： Matthew E. Colburn , Giuseppe Calafiore , Matthieu Charles Raoul Leibovici , Nihar Ranjan Mohanty
摘要： A manufacturing system for fabricating self-aligned grating elements with a variable refractive index includes a patterning system, a deposition system, and an etching system. The manufacturing system performs a lithographic patterning of one or more photoresists to create a stack over a substrate. The manufacturing system performs a conformal deposition of a protective coating on the stack. The manufacturing system performs a deposition of a first photoresist of a first refractive index on the protective coating. The manufacturing system performs a removal of the first photoresist to achieve a threshold value of first thickness. The manufacturing system performs a deposition of a second photoresist of a second refractive index on the first photoresist. The second refractive index is greater than the first refractive index. The manufacturing system performs a removal of the second photoresist to achieve a threshold value of second thickness to form a portion of an optical grating.
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公开(公告)号：US20220128820A1
公开(公告)日：2022-04-28
申请号：US17569477
申请日：2022-01-05
发明人： Ying Geng , Jacques Gollier , Alexander Sohn , Matthew E. Colburn
IPC分类号： G02B27/01 , H01L27/32 , H04N13/332 , H04N13/344 , H04N13/324
摘要： An electronic display assembly includes a display element and a corrective element coupled to the display element. The display element has a first plurality of sub-pixels of a first type and a second plurality of sub-pixels of a second type. Two adjacent sub-pixels of the first plurality of sub-pixel are separated by a sub-pixel distance. The corrective element has a plurality of features configured to diffuse light emitted by the first plurality of sub-pixels such that an apparent distance between the two adjacent sub-pixels of the first type, viewed at a viewing distance away from the electronic display assembly, is less than the sub-pixel distance.
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公开(公告)号：US11150394B2
公开(公告)日：2021-10-19
申请号：US16264245
申请日：2019-01-31
摘要： Techniques for fabricating a slanted structure are disclosed. In one embodiment, a method of fabricating a slanted surface-relief structure in a material layer includes forming a thin hard mask on top of an intermediate mask layer, etching the intermediate mask layer at a slant angle using the thin hard mask to form a slanted intermediate mask, and etching the material layer at the slant angle using the slanted intermediate mask to form the slanted surface-relief structure in the material layer. The intermediate mask layer is characterized by an etch rate greater than an etch rate of the material layer.
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8.发明授权公开(公告)号：US10983257B1
公开(公告)日：2021-04-20
申请号：US16198099
申请日：2018-11-21
IPC分类号： H01L21/308 , H01L21/306 , G03F7/00 , G02B5/18 , G02B27/01 , F21V8/00
摘要： A lithographic patterning of a resist is performed to create a mandrel over a substrate. A deposition of one or more functional materials on the mandrel is performed. And each functional material has a respective refractive index. A selective removal of the mandrel is performed to create a plurality of grating elements formed from the one or more functional materials. The plurality of grating elements are self-aligned and form a diffraction grating. Each grating element may have a heterogenous refractive index (e.g., substantial normal to and/or parallel to a surface of the substrate). The diffraction grating may be used in a near-eye display.
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公开(公告)号：US10962703B1
公开(公告)日：2021-03-30
申请号：US16157462
申请日：2018-10-11
摘要： Provided herein are compositions comprising functionalized gallium-based semiconductor nanoparticles for use in nanoprint resins and high-index overcoat materials. Also provided are methods of manufacturing functionalized gallium-based semiconductor nanoparticles and nanoprint resins and high-index overcoat materials using gallium-based semiconductor nanoparticles.
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公开(公告)号：US10895671B1
公开(公告)日：2021-01-19
申请号：US15878232
申请日：2018-01-23
IPC分类号： G02B5/18 , H01J37/317 , G02B27/01 , F21V8/00
摘要： Ion implantation is used to fabricate an optical device having a varying refractive index. The optical device can include a substrate with a material disposed on the substrate. A refractive index of the material is changed by ion implantation. The material can also be etched or imprinted. The optical device can be used in a virtual-reality system or augmented-reality system to provide angular selectivity from a display to a user's eye.
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