公开(公告)号：US12128704B2

公开(公告)日：2024-10-29

申请号：US18263787

申请日：2022-01-10

Applicant: GIESECKE+DEVRIENT CURRENCY TECHNOLOGY GMBH

Inventor： Winfried Hoffmuller ,  Michael Sobol ,  Andreas Rauch

IPC: B42D25/41 ,  B42D25/373 ,  B42D25/445

CPC classification number: B42D25/41 ,  B42D25/373 ,  B42D25/445

Abstract: The invention relates to a mask exposure method comprising the following steps: —the providing of a carrier substrate; the print application of a radiation-crosslinkable washable dye layer to the full area of the carrier substrate; —the exposure of the radiation-crosslinkable washable dye layer in defined regions to radiation by means of a radiation mask, such that the washable dye is cured in the defined regions; —the applying of a metallization over the full area; —the removing of the non-radiation-exposed washable dye outside the defined regions together with the metal present thereon with the aid of a solvent, such that the resultant carrier substrate has cured washable dye with metal applied thereto only in defined regions.