公开(公告)号：US20190212651A1

公开(公告)日：2019-07-11

申请号：US15867854

申请日：2018-01-11

Applicant: GLOBALFOUNDRIES INC.

Inventor： Robert FINLAY ,  Erik Robert HOSLER ,  Sheldon MEYERS ,  Scott KENNY

IPC: G03F7/16 ,  B05D3/00 ,  B05D1/00 ,  B05B3/02 ,  G03F7/20

CPC classification number: G03F7/164 ,  B05B3/02 ,  B05C11/02 ,  B05D1/005 ,  B05D3/207 ,  G03F7/16 ,  G03F7/162 ,  G03F7/2004

Abstract: An EUV photoresist composition includes paramagnetic particles that are adapted to block EUV radiation. The magnetic manipulation of the paramagnetic particles within a deposited layer of EUV photoresist can beneficially impact focus control and the achievable line width roughness during subsequent photolithographic processing. A spin-coating apparatus for dispensing the EUV photoresist composition onto a substrate includes a plurality of concentric electromagnets located beneath the substrate that influence the distribution of the paramagnetic particles in the photoresist layer.