SILICON CARBIDE SCHOTTKY DIODES
    1.
    发明申请

    公开(公告)号:US20200091281A1

    公开(公告)日:2020-03-19

    申请号:US16469809

    申请日:2017-12-13

    Abstract: A silicon carbide (SiC) Schottky diode comprises a layer of N-type SiC and a layer of P-type SiC in contact with the layer of N-type SiC creating a P-N junction. An anode is in contact with both the layer of N-type SiC and the layer of P-type SiC creating Schottky contacts between the anode and both the layer of N-type SiC and the layer of P-type SiC. An edge of the layer of P-type SiC is electrically active and comprises a tapered negative charge density at the P-N junction, which can be achieved by a tapered or sloping edge the layer of P-type SiC.

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