专利检索 ap:("GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY") AND inv:"Ho Bin Seo" 第 1 页

1.

发明授权
Block copolymer materials containing polyhedral oligomeric silsesquioxane(POSS) 有权

公开(公告)号：US10703858B2

公开(公告)日：2020-07-07

申请号：US16133280

申请日：2018-09-17

申请人： GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY

发明人： Jae Suk Lee , Chang Geun Chae , Mallela Yadagiri Lakshmi Narasimha Kishore , Myung Jin Kim , In Gyu Bak , Ho Bin Seo , Yong Guen Yu

IPC分类号： C08G61/08 , C08G81/00 , C08L87/00

摘要： A macromolecular photonic crystal material including an A block and a B block is disclosed.the A block comprises a crystalline polyhedral oligomeric POSS, the macromolecular photonic crystal material represented by the structural formula 1.