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公开(公告)号：US20210029811A1
公开(公告)日：2021-01-28
申请号：US16894504
申请日：2020-06-05
Applicant: Gigaphoton Inc.
Inventor： Kouichiro KOUGE , Yusuke HOSHINO , Toshihiro NISHISAKA , Takashi OKADA
Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.
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