公开(公告)号：US20210298160A1

公开(公告)日：2021-09-23

申请号：US17156186

申请日：2021-01-22

Applicant: Gigaphoton Inc.

Inventor： Takayuki OSANAI ,  Atsushi UEDA ,  Koichiro KOGE ,  Akihiro OHSAWA ,  Toshiya SHINTANI ,  Yoshiaki YOSHIDA ,  Yuki ISHIDA ,  Yosuke TAKADA

IPC: H05G2/00 ,  H01J37/32

Abstract: An extreme ultraviolet light generation apparatus may include a chamber device, a concentrating mirror, a central gas supply port configured to supply gas along a focal line passing through a first focal point and a second focal point from the center side of the reflection surface, and a first peripheral gas supply port disposed at a peripheral portion of the reflection surface and configured to supply gas in a direction from the outer side of the reflection surface toward the inner side of the reflection surface. The first peripheral gas supply port may supply gas, when viewed along the focal line, in an inclined direction inclined to a tangential direction side of the peripheral portion at the peripheral portion where the first peripheral gas supply port is located with respect to a first straight line passing through the first peripheral gas supply port and the focal line.