摘要:
Nitrogenated evaporable getter devices are disclosed which are resistant to the fritting conditions of the production processes of kinescopes for times of about five hours. A process is also disclosed for the production of these devices. The nitrogenated evaporable getter material comprises: 1) BaAl.sub.4 powder, 2) nickel powder, and 3) iron nitride and/or germanium nitride particles that have been coated with a thin vitreous layer of boron oxide and silicon oxide, formed through a sol-gel process employing a starting solution wherein the atomic ratio between boron and silicon ranges from about 4:1 to 0.75:1.