专利检索 ap:("HILLE & MÜLLER GMBH") AND inv:"Maurice Jean, Robert JANSEN" 第 1 页

1.

发明申请
LOW INTERFACIAL CONTACT RESISTANCE MATERIAL, USE THEREOF AND METHOD OF PRODUCING SAID MATERIAL 有权

公开(公告)号：US20210087648A1

公开(公告)日：2021-03-25

申请号：US16630022

申请日：2018-07-10

申请人： HILLE & MÜLLER GMBH

发明人： Ernst Wilhelm VOM BEY , Marcel ONINK , Ken-Dominic FLECHTNER , Maurice Jean, Robert JANSEN

IPC分类号： C21D9/48 , C21D8/04 , B32B15/01 , H01M50/128 , H01M50/164 , H01M50/526

摘要： Method of producing a low interfacial contact resistance material for use in batteries or connectors and a low interfacial contact resistance material for use in batteries or connectors produced thereby.